SHIMADZU島津 傅立葉轉換紅外線光譜儀
IRAffinity-1S
- 採用高能量陶瓷光源、高通量光學元件、高敏感度DLATGS檢測器 (S/N Ratio:30,000:1)。
- 內置標準的動態校正(ADA)系統及高效自動電子除濕裝置，具備自我診斷功能和狀態監視器，遵照JP/EP/ASTM的有效性。
- 撘配操作簡易的 FTIR軟體IR Solution，支持FDA21CFR Part II。
機型規格表
| Wave number range | 7,800 to 350 cm-1 |
|---|---|
| Resolution | 0.5, 1, 2, 4, 8, or 16 cm-1 |
| S/N ratio | 30,000:1 or higher (peak-to-peak, 4 cm-1 resolution, in a neighborhood of 2,100 cm-1, 1-minute accumulation) |
| Dimensions | 514(W) x 606(D) x 273(H) mm |
| Weight | 35 kg |
※(注) 規格如有更改恕不另行通知。
應用分析
Automobiles
- Material identification tests
- Analysis of contaminant
- Failure analysis
Chemicals and Polymers
- Raw material identification tests
- Qualitative analysis of plasticsand rubber
- Identification of functional groups of synthetic products
- Analysis of surface preparation agents
- Analysis and thickness measurement of thin films
- Analysis of catalysts
- Analysis of paints and coatings
- Analysis of contaminant
- Quantitative analysis
Food Products
- Raw material identification tests
- Packaging material identification tests
- Analysis of contaminant
Medicine
- Raw material identification tests
- Identification of functional groups of synthetic products
- Identification of functional groups of natural products
- Analysis of contaminant
Metals
- Qualitative analysis of thin films on metal plates
- Analysis and thickness measurement of thin films
- Analysis of contaminant
Electricity, Electronics and Semiconductors
- Thickness measurement of epitaxial films
- Quantitative analysis of interstitial oxygen and substituted carbon
- Quantitative analysis of phosphorus and boron in BPGS
- Quantitative analysis of hydrogen concentration in nitride film
- Quantitative analysis of hydrogen concentration in amorphous silicon
- Detection of brominated flame retardants
- Analysis of thin films
- Analysis of contaminant
- Failure analysis
- Analysis of semiconductor gases
Construction
- Material identification tests
- Degradation analysis of coatings
Cosmetics
- Material identification tests
- Analysis of contaminant
- Failure analysis